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Strain engineering of the electroabsorption response in Ge/SiGe multiple quantum well heterostructures
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Strain engineering of the electroabsorption response in Ge/SiGe multiple quantum well heterostructures

L Lever, Y Hu, M Myronov, X Liu, N Owens, FY Gardes, IP Marko, SJ Sweeney, Z Ikonić, DR Leadley, …
8th IEEE International Conference on Group IV Photonics, pp.107-108
Group IV Photonics (London, UK, 14/09/2011 - 16/09/2011)
2011

Abstract

Many fibre-optic telecommunications systems exploit the spectral `window' at 1310 nm, which corresponds to zero dispersion in standard single-mode fibres (SMFs). In particular, several passive optical network (PON) architectures use 1310 nm for upstream signals,1 and so compact, low-cost and low-power modulators operating at 1310 nm that can be integrated into Si electronic-photonic integrated circuits would be extremely desireable for future fibre-to-the-home (FTTH) applications.
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