Stoichiometric limitations of RF plasma deposited amorphous silicon-nitrogen alloys

SA Almeida; SRP Silva

doi:10.1016/S0040-6090(97)00460-4

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Stoichiometric limitations of RF plasma deposited amorphous silicon-nitrogen alloys

Journal article

Peer reviewed

Stoichiometric limitations of RF plasma deposited amorphous silicon-nitrogen alloys

SA Almeida and SRP Silva

THIN SOLID FILMS, Vol.311(1-2), pp.133-137

31/12/1997

DOI: https://doi.org/10.1016/S0040-6090(97)00460-4

Abstract

Science & Technology

Technology

Physical Sciences

Materials Science

Multidisciplinary

Materials Science

Coatings & Films

Physics

Applied

Physics

Condensed Matter

Materials Science

Physics

MATERIALS SCIENCE

COATINGS & FILMS

MATERIALS SCIENCE

MULTIDISCIPLINARY

PHYSICS

APPLIED

PHYSICS

CONDENSED MATTER

amorphous materials

Rutherford backscattering spectroscopy

silicon nitride

stress

LIGHT-EMITTING DIODE

CHEMICAL-VAPOR-DEPOSITION

SINX

LAYERS

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Title: Stoichiometric limitations of RF plasma deposited amorphous silicon-nitrogen alloys
Creators: SA Almeida
SRP Silva
Publication Details: THIN SOLID FILMS, Vol.311(1-2), pp.133-137
Publisher: ELSEVIER SCIENCE SA
Date published: 31/12/1997
Date submitted: 17/05/2017
Identifiers: 99511096202346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

Stoichiometric limitations of RF plasma deposited amorphous silicon-nitrogen alloys

Abstract

Files and links (1)

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