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Plasma Jet Printing and in Situ Reduction of Highly Acidic Graphene Oxide
Journal article   Peer reviewed

Plasma Jet Printing and in Situ Reduction of Highly Acidic Graphene Oxide

Avishek Dey, Satheesh Krishnamurthy, James Bowen, Dennis Nordlund, M. Meyyappan, Ram P. Gandhiraman and SLAC National Accelerator Lab., Menlo Park, CA (United States)
ACS nano, Vol.12(6), pp.5473-5481
26/06/2018
PMID: 29775279

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