A Comparative Study of Interaction of End of Range (EOR) Defect Band with Upper Buried Oxide (BOX) Interface for B and BF(2) Implants in SOI and Bulk Silicon with Pre-Amorphizing Implant

M Kah; AJ Smith; JJ Hamilton; SH Yeong; B Columbeau; R Gwilliam; RP Webb; KJ Kirkby

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A Comparative Study of Interaction of End of Range (EOR) Defect Band with Upper Buried Oxide (BOX) Interface for B and BF(2) Implants in SOI and Bulk Silicon with Pre-Amorphizing Implant

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A Comparative Study of Interaction of End of Range (EOR) Defect Band with Upper Buried Oxide (BOX) Interface for B and BF(2) Implants in SOI and Bulk Silicon with Pre-Amorphizing Implant

M Kah, AJ Smith, JJ Hamilton, SH Yeong, B Columbeau, R Gwilliam, RP Webb and KJ Kirkby

ION IMPLANTATION TECHNOLOGY 2008, Vol.1066, pp.51-54

17th International Conference on Ion Implantation Technology (Monterey, CA, 08/06/2008–13/06/2008)

01/01/2008

Abstract

Science & Technology

Technology

Physical Sciences

Engineering

Electrical & Electronic

Materials Science

Multidisciplinary

Physics

Applied

Engineering

Materials Science

Physics

B

BF(2)

pre-amorphization

silicon-on-insulator

BORON

FLUORINE

SI

DIFFUSION

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Title: A Comparative Study of Interaction of End of Range (EOR) Defect Band with Upper Buried Oxide (BOX) Interface for B and BF(2) Implants in SOI and Bulk Silicon with Pre-Amorphizing Implant
Creators: M Kah
AJ Smith
JJ Hamilton
SH Yeong
B Columbeau
R Gwilliam
RP Webb
KJ Kirkby
Contributors: EG Seebauer
YV Kondratenko
SB Felch
A Jain
AMER INST PHYSICS (Publisher)
Publication Details: ION IMPLANTATION TECHNOLOGY 2008, Vol.1066, pp.51-54
Conference: 17th International Conference on Ion Implantation Technology (Monterey, CA, 08/06/2008–13/06/2008)
Publication Date: 01/01/2008
Identifiers: 99515798102346
Academic Unit: University of Surrey
Resource Type: Conference presentation

A Comparative Study of Interaction of End of Range (EOR) Defect Band with Upper Buried Oxide (BOX) Interface for B and BF(2) Implants in SOI and Bulk Silicon with Pre-Amorphizing Implant

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