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Growth of microcrystalline beta-SiC films on silicon by ECR plasma CVD
Conference presentation   Peer reviewed

Growth of microcrystalline beta-SiC films on silicon by ECR plasma CVD

SJ Toal, HS Reehal, NP Barradas and C Jeynes
APPLIED SURFACE SCIENCE, Vol.138, pp.424-428
Symposium on Surface Processing - Laser, Lamp, Plasma, at the Annual Spring Meeting of the European-Materials-Society (E-MRS 96) (STRASBOURG, FRANCE, 16/06/1996 - 19/06/1998)
01/01/1999
DOI: https://doi.org/10.1016/S0169-4332(98)00435-8

Abstract

Science & Technology Physical Sciences Technology Chemistry Physical Materials Science Coatings & Films Physics Applied Physics Condensed Matter Chemistry Materials Science Physics CHEMISTRY PHYSICAL MATERIALS SCIENCE COATINGS & FILMS PHYSICS APPLIED PHYSICS CONDENSED MATTER microcrystalline silicon carbide solar cells ECR-CVD Rutherford backscattering simulated annealing CARBIDE FILMS THIN-FILMS DEPOSITION
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