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Characterization of arsenic plasma doping and postimplant processing of silicon using medium energy ion scattering
Journal article   Open access   Peer reviewed

Characterization of arsenic plasma doping and postimplant processing of silicon using medium energy ion scattering

Jaap van den Berg, Andrew Rossall and Jonathan England
Journal of Vacuum Science & Technology B, Vol.37(3), pp.032901-1
09/04/2019

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The characterisation of arsenic plasma doping1.79 MBDownloadView
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https://doi.org/10.1116/1.5088954View
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