Reduction of Boron Cross Contamination During Arsenic Implantation in the Applied Materials Precision Implant 9500

Conference presentation

Peer reviewed

J. Horvath, N. Little, D. Rigsby, M. Anthony and Jonathan England

Ion Implantation Technology-94: Proceedings of the Tenth International Conference on Ion Implantation Technology Catania, Italy, June 13-17, 1994

Ion Implantation Technology 94 (IIT 94) (Catania, Italy, 13/06/1994 - 17/06/1994)

16/05/1995

Abstract

url

https://www.elsevier.com/books/ion-implantation-technology-94/coffa/978-0-444-82194-2View

Published (Version of record)

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Title: Reduction of Boron Cross Contamination During Arsenic Implantation in the Applied Materials Precision Implant 9500
Creators: J. Horvath
N. Little
D. Rigsby
M. Anthony
Jonathan England
Contributors: S. Coffa
G Ferla
E. Rimini
F. Priolo
Publication Details: Ion Implantation Technology-94: Proceedings of the Tenth International Conference on Ion Implantation Technology Catania, Italy, June 13-17, 1994
Conference: Ion Implantation Technology 94 (IIT 94) (Catania, Italy, 13/06/1994 - 17/06/1994)
Date published: 16/05/1995
Date submitted: 15/06/2017
Identifiers: 99515329202346
Academic Unit: School of Computer Science and Electronic Engineering
Resource Type: Conference presentation