Highly photoconductive amorphous carbon nitride films prepared by cyclic nitrogen radical sputtering

T Katsuno; S Nitta; H Habuchi; V Stolojan; SRP Silva

doi:10.1063/1.1792384

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Highly photoconductive amorphous carbon nitride films prepared by cyclic nitrogen radical sputtering

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Highly photoconductive amorphous carbon nitride films prepared by cyclic nitrogen radical sputtering

T Katsuno, S Nitta, H Habuchi, V Stolojan and SRP Silva

APPLIED PHYSICS LETTERS, Vol.85(14), pp.2803-2805

04/10/2004

DOI: https://doi.org/10.1063/1.1792384

Abstract

Science & Technology

Physical Sciences

Physics

Applied

Physics

PHYSICS

APPLIED

HYDROGENATED CARBON

ELECTROLUMINESCENCE

LUMINESCENCE

ALLOYS

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Title: Highly photoconductive amorphous carbon nitride films prepared by cyclic nitrogen radical sputtering
Creators: T Katsuno
S Nitta
H Habuchi
V Stolojan
SRP Silva
Publication Details: APPLIED PHYSICS LETTERS, Vol.85(14), pp.2803-2805
Publisher: AMER INST PHYSICS
Date published: 04/10/2004
Date submitted: 27/05/2010
Identifiers: 99515161602346
Academic Unit: School of Computer Science and Electronic Engineering
Language: English
Resource Type: Journal article

Highly photoconductive amorphous carbon nitride films prepared by cyclic nitrogen radical sputtering

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