Interactions of photoresist stripping plasmas with nanoporous organo-silicate ultra low dielectric constant dielectrics

P Lazzeri; GS Oehrlein; GJ Stueber; R McGowan; E Busch; S Pederzoli; C Jeynes; M Bersani; M Anderle

doi:10.1016/j.tsf.2007.08.043

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Interactions of photoresist stripping plasmas with nanoporous organo-silicate ultra low dielectric constant dielectrics

P Lazzeri, GS Oehrlein, GJ Stueber, R McGowan, E Busch, S Pederzoli, C Jeynes, M Bersani and M Anderle

THIN SOLID FILMS, Vol.516(11), pp.3697-3703

28th Dry Process Symposium (DPS) (Nagoya, JAPAN, 29/11/2006 - 30/11/2006)

01/04/2008

DOI: https://doi.org/10.1016/j.tsf.2007.08.043

Abstract

Science & Technology

Technology

Physical Sciences

Materials Science

Multidisciplinary

Materials Science

Coatings & Films

Physics

Applied

Physics

Condensed Matter

Materials Science

Physics

MATERIALS SCIENCE

COATINGS & FILMS

MATERIALS SCIENCE

MULTIDISCIPLINARY

PHYSICS

APPLIED

PHYSICS

CONDENSED MATTER

organo-silicate

dielectiic

low-k

stripping

ashing

plasma

damage

ToF-SIMS

FLUOROCARBON PLASMAS

LOW-K

FILMS

SURFACE

ULK

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Title: Interactions of photoresist stripping plasmas with nanoporous organo-silicate ultra low dielectric constant dielectrics
Creators: P Lazzeri
GS Oehrlein
GJ Stueber
R McGowan
E Busch
S Pederzoli
C Jeynes
M Bersani
M Anderle
Contributors: ELSEVIER SCIENCE SA (null)
Publication Details: THIN SOLID FILMS, Vol.516(11), pp.3697-3703
Conference: 28th Dry Process Symposium (DPS) (Nagoya, JAPAN, 29/11/2006 - 30/11/2006)
Date published: 01/04/2008
Date submitted: 24/10/2014
Identifiers: 99514929802346
Academic Unit: University of Surrey
Resource Type: Conference presentation

Interactions of photoresist stripping plasmas with nanoporous organo-silicate ultra low dielectric constant dielectrics

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