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The Dielectric Properties of Co-Implanted SiO(2) Investigated Using Spatially-Resolved EELS
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The Dielectric Properties of Co-Implanted SiO(2) Investigated Using Spatially-Resolved EELS

V Stolojan, W Tsang, SRP Silva, AG Cullis and PA Midgley
MICROSCOPY OF SEMICONDUCTING MATERIALS 2007, Vol.120, pp.341-344
15th Conference on Microscopy of Semiconducting Materials (Univ Cambridge, Cambridge, ENGLAND, 02/04/2007 - 05/04/2007)
01/01/2008

Abstract

Science & Technology Technology Physical Sciences Nanoscience & Nanotechnology Microscopy Physics Condensed Matter Science & Technology - Other Topics Physics FIELD-EMISSION
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