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Effects of process variations on the current in Schottky Barrier Source-Gated Transistors
Journal article   Open access  Peer reviewed

Effects of process variations on the current in Schottky Barrier Source-Gated Transistors

RA Sporea, X Guo, JM Shannon and SRP Silva
Proceedings of the International Semiconductor Conference (CAS), Vol.2, pp.413-416
CAS 2009 (Sinaia, Romania, 12/10/2009 - 14/10/2009)
2009

Abstract

The sensitivity of the drain current in Schottky barrier source-gated transistors to process variation is studied using computer simulations. It is shown that provided the device is designed correctly, the current is independent of source-drain separation and is insensitive to source length variations. However, uniform insulator thickness and precise control of the source barrier is needed if good current uniformity is to be obtained.
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http://dx.doi.org/10.1109/SMICND.2009.5336693View
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