SURFACE DAMAGE IN NANOMACHINED SILICON

KE PUTTICK; C JEYNES; M RUDMAN; AE GEE; CL CHAO

doi:10.1088/0268-1242/7/2/013

Back

Journal article

Peer reviewed

SURFACE DAMAGE IN NANOMACHINED SILICON

KE PUTTICK, C JEYNES, M RUDMAN, AE GEE and CL CHAO

SEMICONDUCTOR SCIENCE AND TECHNOLOGY, Vol.7(2), pp.255-259

01/02/1992

DOI: https://doi.org/10.1088/0268-1242/7/2/013

Abstract

Science & Technology

Technology

Physical Sciences

Engineering

Electrical & Electronic

Materials Science

Multidisciplinary

Physics

Condensed Matter

Engineering

Materials Science

Physics

ENGINEERING

ELECTRICAL & ELECTRONIC

MATERIALS SCIENCE

MULTIDISCIPLINARY

PHYSICS

CONDENSED MATTER

Files and links (1)

url

http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:A1992HD67600013&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=11d2a86992e85fb529977dad66a846d5View

Author

Metrics

32 Record Views

12 Times Cited - Web of Science

Details

Title: SURFACE DAMAGE IN NANOMACHINED SILICON
Creators: KE PUTTICK
C JEYNES
M RUDMAN
AE GEE
CL CHAO
Publication Details: SEMICONDUCTOR SCIENCE AND TECHNOLOGY, Vol.7(2), pp.255-259
Publisher: IOP PUBLISHING LTD
Date published: 01/02/1992
Date submitted: 17/05/2017
Identifiers: 99514317002346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

SURFACE DAMAGE IN NANOMACHINED SILICON

Abstract

Files and links (1)

Metrics

Details

Usage Policy