Optical Pattern Fabrication in Amorphous Silicon Carbide with High-Energy Focused Ion Beams

T Tsvetkova; S Takahashi; P Sellin; I Gomez-Morilla; O Angelov; D Dimova-Malinovska; J Zuk

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Optical Pattern Fabrication in Amorphous Silicon Carbide with High-Energy Focused Ion Beams

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Optical Pattern Fabrication in Amorphous Silicon Carbide with High-Energy Focused Ion Beams

T Tsvetkova, S Takahashi, P Sellin, I Gomez-Morilla, O Angelov, D Dimova-Malinovska and J Zuk

ACTA PHYSICA POLONICA A, Vol.120(1), pp.56-59

8th International Conference on Ion Implantation and Other Applications of Ions and Electrons - ION 2010 (Maria Curie-Sklodowska Univ, Kazimierz Dolny, POLAND, 14/06/2010–17/06/2010)

01/07/2011

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Title: Optical Pattern Fabrication in Amorphous Silicon Carbide with High-Energy Focused Ion Beams
Creators: T Tsvetkova
S Takahashi
P Sellin
I Gomez-Morilla
O Angelov
D Dimova-Malinovska
J Zuk
Contributors: POLISH ACAD SCIENCES INST PHYSICS (Publisher)
Publication Details: ACTA PHYSICA POLONICA A, Vol.120(1), pp.56-59
Conference: 8th International Conference on Ion Implantation and Other Applications of Ions and Electrons - ION 2010 (Maria Curie-Sklodowska Univ, Kazimierz Dolny, POLAND, 14/06/2010–17/06/2010)
Publication Date: 01/07/2011
Identifiers: 99514242702346
Academic Unit: University of Surrey
Resource Type: Conference presentation

Optical Pattern Fabrication in Amorphous Silicon Carbide with High-Energy Focused Ion Beams

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