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Comparison of boron halide, decaborane and B implants in Si from molecular dynamics simulations
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Comparison of boron halide, decaborane and B implants in Si from molecular dynamics simulations

RP Webb, SH Winston, RM Gwilliam, BJ Sealy, G Boudreault, C Jeynes and KJ Kirkby
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.202, pp.143-148
6th International Conference on Computer Simulation of Radiation Effects in Solids (DRESDEN, GERMANY, 23/06/2002 - 27/06/2002)
01/04/2003

Abstract

Science & Technology Technology Physical Sciences Instruments & Instrumentation Nuclear Science & Technology Physics Atomic Molecular & Chemical Physics Nuclear Physics INSTRUMENTS & INSTRUMENTATION NUCLEAR SCIENCE & TECHNOLOGY PHYSICS ATOMIC MOLECULAR & CHEMICAL PHYSICS NUCLEAR molecular implantation silicon processing molecular dynamics ion beams
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