Abstract
Characterization of the Ge concentration in a Si1-xGe x heterojunction for x varying from 5% to 40% in steps of 5% is done by beveling and wet thermal oxidation of the exposed layers. The resulting difference in oxide thickness as a function of Ge concentration is visualized due to light interference. Different Ge concentrations are seen as different colors through an optical microscope. CABOOM - Characterization of the Alloy concentration by Beveling, Oxidation and Optical Microscopy - in combination with AFM - Atomic Force Microscopy, is used as a tool to study the oxidation kinetics of unstrained, crystalline Si1-xGex by wet thermal oxidation.