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Comparison of elemental boron and boron halide implants into silicon
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Comparison of elemental boron and boron halide implants into silicon

JA Sharp, RM Gwilliam, BJ Sealy, C Jeynes, JJ Hamilton and KJ Kirkby
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.237(1-2), pp.93-97
15th International Conference on Ion Implantation Technology (Taipei, TAIWAN, 25/10/2004 - 27/10/2004)
01/08/2005

Abstract

Science & Technology Technology Physical Sciences Instruments & Instrumentation Nuclear Science & Technology Physics Atomic Molecular & Chemical Physics Nuclear Physics INSTRUMENTS & INSTRUMENTATION NUCLEAR SCIENCE & TECHNOLOGY PHYSICS ATOMIC MOLECULAR & CHEMICAL PHYSICS NUCLEAR semiconductors boron shallow-junctions activation RBS
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