LONG-RANGE CHANNELING IN LOW-ENERGY ION-IMPLANTATION INTO SILICON

R SMITH; RP WEBB

doi:10.1080/09500839108214619

Back

LONG-RANGE CHANNELING IN LOW-ENERGY ION-IMPLANTATION INTO SILICON

Journal article

Peer reviewed

LONG-RANGE CHANNELING IN LOW-ENERGY ION-IMPLANTATION INTO SILICON

R SMITH and RP WEBB

PHILOSOPHICAL MAGAZINE LETTERS, Vol.64(5), pp.253-260

01/11/1991

DOI: https://doi.org/10.1080/09500839108214619

Abstract

Science & Technology

Physical Sciences

Physics

Condensed Matter

Physics

PHYSICS

CONDENSED MATTER

KEV PARTICLE BOMBARDMENT

SIMULATION

GROWTH

Files and links (1)

url

http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:A1991GP57900002&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=11d2a86992e85fb529977dad66a846d5View

Author

Metrics

31 Record Views

11 Times Cited - Web of Science

Details

Title: LONG-RANGE CHANNELING IN LOW-ENERGY ION-IMPLANTATION INTO SILICON
Creators: R SMITH
RP WEBB
Publication Details: PHILOSOPHICAL MAGAZINE LETTERS, Vol.64(5), pp.253-260
Publisher: TAYLOR & FRANCIS LTD
Date published: 01/11/1991
Date submitted: 17/05/2017
Identifiers: 99512851502346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

LONG-RANGE CHANNELING IN LOW-ENERGY ION-IMPLANTATION INTO SILICON

Abstract

Files and links (1)

Metrics

Details

Usage Policy