MICROUNIFORMITY MEASUREMENTS OF ION-IMPLANTED SILICON

MI CURRENT; N OHNO; K HURLEY; WA KEENAN; TL GUITNER; C JEYNES

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Journal article

MICROUNIFORMITY MEASUREMENTS OF ION-IMPLANTED SILICON

MI CURRENT, N OHNO, K HURLEY, WA KEENAN, TL GUITNER and C JEYNES

SOLID STATE TECHNOLOGY, Vol.36(7), pp.111-&

01/07/1993

Abstract

Science & Technology

Technology

Physical Sciences

Engineering

Electrical & Electronic

Physics

Applied

Physics

Condensed Matter

Engineering

Physics

ENGINEERING

ELECTRICAL & ELECTRONIC

PHYSICS

APPLIED

PHYSICS

CONDENSED MATTER

SCAN PATTERN

UNIFORMITY

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Title: MICROUNIFORMITY MEASUREMENTS OF ION-IMPLANTED SILICON
Creators: MI CURRENT
N OHNO
K HURLEY
WA KEENAN
TL GUITNER
C JEYNES
Publication Details: SOLID STATE TECHNOLOGY, Vol.36(7), pp.111-&
Publisher: PENNWELL PUBL CO SOLID STATE TECHNOLOGY OFFICE
Date published: 01/07/1993
Date submitted: 17/05/2017
Identifiers: 99512524602346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

MICROUNIFORMITY MEASUREMENTS OF ION-IMPLANTED SILICON

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