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XPS investigation of preferential sputtering of S from MoS2 and determination of MoSx stoichiometry from Mo and S peak positions
Journal article   Peer reviewed

XPS investigation of preferential sputtering of S from MoS2 and determination of MoSx stoichiometry from Mo and S peak positions

MA Baker, R Gilmore, C Lenardi and W Gissler
APPLIED SURFACE SCIENCE, Vol.150(1-4), pp.255-262
01/08/1999
DOI: https://doi.org/10.1016/S0169-4332(99)00253-6

Abstract

Science & Technology Physical Sciences Technology Chemistry Physical Materials Science Coatings & Films Physics Applied Physics Condensed Matter Chemistry Materials Science Physics CHEMISTRY PHYSICAL MATERIALS SCIENCE COATINGS & FILMS PHYSICS APPLIED PHYSICS CONDENSED MATTER MoS2 XPS preferential sputtering ION-BOMBARDMENT LOW-FRICTION FILMS COATINGS LUBRICATION SURFACE
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