- Title
- Elemental thin film depth profiles by ion beam analysis using simulated annealing - a new tool
- Creators
- C JeynesNP BarradasPK MarriottG BoudreaultM JenkinE WendlerRP Webb
- Publication Details
- JOURNAL OF PHYSICS D-APPLIED PHYSICS, Vol.36(7), pp.R97-R126
- Publisher
- IOP PUBLISHING LTD
- Publication Date
- 07/04/2003
- Identifiers
- 99511981102346; WOS:000182586400001
- Academic Unit
- School of Computer Science and Electronic Engineering
- Language
- English
- Resource Type
- Journal article
Journal article
Elemental thin film depth profiles by ion beam analysis using simulated annealing - a new tool
JOURNAL OF PHYSICS D-APPLIED PHYSICS, Vol.36(7), pp.R97-R126
07/04/2003