Characterization and enviromental impact of plasma products within an ion implanter

H Zurrug; J Mefo; B Sealy; G Boudreault; C Jeynes; RP Webb; KJ Kirkby; EJH Collart; B Brown; TL Alford; M Nastasi; MC Vella

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Characterization and enviromental impact of plasma products within an ion implanter

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Characterization and enviromental impact of plasma products within an ion implanter

H Zurrug, J Mefo, B Sealy, G Boudreault, C Jeynes, RP Webb, KJ Kirkby, EJH Collart, B Brown, TL Alford, …

IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, pp.471-474

14th International Conference on Ion Implantation Technology (TAOS, NM, 18/09/2002 - 27/09/2002)

01/01/2003

Abstract

Science & Technology

Technology

Physical Sciences

Engineering

Manufacturing

Engineering

Electrical & Electronic

Physics

Applied

Physics

Condensed Matter

Engineering

Physics

ion implantation

plasma products

implant residues

plasma-dopant interactions

Rutherford Backscattering (RBS)

Sb implantation

B implantation

silicon

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Title: Characterization and enviromental impact of plasma products within an ion implanter
Creators: H Zurrug
J Mefo
B Sealy
G Boudreault
C Jeynes
RP Webb
KJ Kirkby
EJH Collart
B Brown
TL Alford
M Nastasi
MC Vella
Contributors: IEEE (null)
Publication Details: IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, pp.471-474
Conference: 14th International Conference on Ion Implantation Technology (TAOS, NM, 18/09/2002 - 27/09/2002)
Date published: 01/01/2003
Date submitted: 27/05/2010
Identifiers: 99511223502346
Academic Unit: School of Computer Science and Electronic Engineering
Resource Type: Conference presentation

Characterization and enviromental impact of plasma products within an ion implanter

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