Vacancy engineering for ultra-shallow junction formation

R Gwilliam; NEB Cowern; B Colombeau; B Sealy; AJ Smith

doi:10.1016/j.nimb.2007.04.048

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Vacancy engineering for ultra-shallow junction formation

Journal article

Peer reviewed

Vacancy engineering for ultra-shallow junction formation

R Gwilliam, NEB Cowern, B Colombeau, B Sealy and AJ Smith

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.261(1-2), pp.600-603

01/08/2007

DOI: https://doi.org/10.1016/j.nimb.2007.04.048

Abstract

Science & Technology

Technology

Physical Sciences

Instruments & Instrumentation

Nuclear Science & Technology

Physics

Atomic

Molecular & Chemical

Physics

Nuclear

Physics

INSTRUMENTS & INSTRUMENTATION

NUCLEAR SCIENCE & TECHNOLOGY

PHYSICS

ATOMIC

MOLECULAR & CHEMICAL

PHYSICS

NUCLEAR

vacancy engineering

boron doping

SOI

solid solubility

BORON-INTERSTITIAL CLUSTERS

TRANSIENT ENHANCED DIFFUSION

SILICON

IMPLANTS

SI

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Title: Vacancy engineering for ultra-shallow junction formation
Creators: R Gwilliam
NEB Cowern
B Colombeau
B Sealy
AJ Smith
Publication Details: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.261(1-2), pp.600-603
Publisher: ELSEVIER SCIENCE BV
Date published: 01/08/2007
Date submitted: 17/05/2017
Identifiers: 99513898402346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

Vacancy engineering for ultra-shallow junction formation

Abstract

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