Thermal stability of plasma deposited thin films of hydrogenated carbon-nitrogen alloys

JV Anguita; SRP Silva; AP Burden; BJ Sealy; S Haq; M Hebbron; I Sturland; A Pritchard

doi:10.1063/1.371685

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Thermal stability of plasma deposited thin films of hydrogenated carbon-nitrogen alloys

Journal article

Peer reviewed

Thermal stability of plasma deposited thin films of hydrogenated carbon-nitrogen alloys

JV Anguita, SRP Silva, AP Burden, BJ Sealy, S Haq, M Hebbron, I Sturland and A Pritchard

JOURNAL OF APPLIED PHYSICS, Vol.86(11), pp.6276-6281

01/12/1999

DOI: https://doi.org/10.1063/1.371685

Abstract

Science & Technology

Physical Sciences

Physics

Applied

Physics

PHYSICS

APPLIED

TETRAHEDRAL AMORPHOUS-CARBON

OPTICAL-PROPERTIES

NITRIDE

DISCHARGE

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Title: Thermal stability of plasma deposited thin films of hydrogenated carbon-nitrogen alloys
Creators: JV Anguita
SRP Silva
AP Burden
BJ Sealy
S Haq
M Hebbron
I Sturland
A Pritchard
Publication Details: JOURNAL OF APPLIED PHYSICS, Vol.86(11), pp.6276-6281
Publisher: AMER INST PHYSICS
Date published: 01/12/1999
Date submitted: 17/05/2017
Identifiers: 99511750902346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

Thermal stability of plasma deposited thin films of hydrogenated carbon-nitrogen alloys

Abstract

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