Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

J Schwan; S Ulrich; H Roth; H Ehrhardt; SRP Silva; J Robertson; R Samlenski; R Brenn

doi:10.1063/1.360979

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Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

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Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

J Schwan, S Ulrich, H Roth, H Ehrhardt, SRP Silva, J Robertson, R Samlenski and R Brenn

JOURNAL OF APPLIED PHYSICS, Vol.79(3), pp.1416-1422

01/02/1996

DOI: https://doi.org/10.1063/1.360979

Abstract

Science & Technology

Physical Sciences

Physics

Applied

Physics

PHYSICS

APPLIED

DIAMOND-LIKE CARBON

RAMAN-SCATTERING

DEPOSITION

ENERGY

PRESSURE

GROWTH

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Title: Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating
Creators: J Schwan
S Ulrich
H Roth
H Ehrhardt
SRP Silva
J Robertson
R Samlenski
R Brenn
Publication Details: JOURNAL OF APPLIED PHYSICS, Vol.79(3), pp.1416-1422
Publisher: AMER INST PHYSICS
Date published: 01/02/1996
Date submitted: 29/09/2010
Identifiers: 99513337002346
Academic Unit: School of Computer Science and Electronic Engineering
Language: English
Resource Type: Journal article

Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

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