Targeting mass-selected cluster ions for the deposition of advanced carbonaceous materials using an inductively coupled plasma

DA Zeze; SRP Silva; NMD Brown; AM Joyce; CA Anderson

doi:10.1063/1.1435417

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Targeting mass-selected cluster ions for the deposition of advanced carbonaceous materials using an inductively coupled plasma

Journal article

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Targeting mass-selected cluster ions for the deposition of advanced carbonaceous materials using an inductively coupled plasma

DA Zeze, SRP Silva, NMD Brown, AM Joyce and CA Anderson

JOURNAL OF APPLIED PHYSICS, Vol.91(4), pp.1819-1827

15/02/2002

DOI: https://doi.org/10.1063/1.1435417

Abstract

Science & Technology

Physical Sciences

Physics

Applied

Physics

PHYSICS

APPLIED

DIAMOND-LIKE CARBON

AMORPHOUS-CARBON

BEAM DEPOSITION

NITRIDE FILMS

OVERCOATS

GROWTH

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Title: Targeting mass-selected cluster ions for the deposition of advanced carbonaceous materials using an inductively coupled plasma
Creators: DA Zeze
SRP Silva
NMD Brown
AM Joyce
CA Anderson
Publication Details: JOURNAL OF APPLIED PHYSICS, Vol.91(4), pp.1819-1827
Publisher: AMER INST PHYSICS
Date published: 15/02/2002
Date submitted: 21/10/2010
Identifiers: 99511602702346
Academic Unit: School of Computer Science and Electronic Engineering
Language: English
Resource Type: Journal article

Targeting mass-selected cluster ions for the deposition of advanced carbonaceous materials using an inductively coupled plasma

Abstract

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