Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD

SJ Toal; HS Reehal; SJ Webb; NP Barradas; C Jeynes

doi:10.1016/S0040-6090(98)01585-5

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Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD

Journal article

Peer reviewed

Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD

SJ Toal, HS Reehal, SJ Webb, NP Barradas and C Jeynes

THIN SOLID FILMS, Vol.343, pp.292-294

01/04/1999

DOI: https://doi.org/10.1016/S0040-6090(98)01585-5

Abstract

Science & Technology

Technology

Physical Sciences

Materials Science

Multidisciplinary

Materials Science

Coatings & Films

Physics

Applied

Physics

Condensed Matter

Materials Science

Physics

MATERIALS SCIENCE

COATINGS & FILMS

MATERIALS SCIENCE

MULTIDISCIPLINARY

PHYSICS

APPLIED

PHYSICS

CONDENSED MATTER

raman scattering

x-ray diffraction

silicon carbide

ECR plasma CVD

CHEMICAL-VAPOR-DEPOSITION

CARBIDE

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Title: Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD
Creators: SJ Toal
HS Reehal
SJ Webb
NP Barradas
C Jeynes
Publication Details: THIN SOLID FILMS, Vol.343, pp.292-294
Publisher: ELSEVIER SCIENCE SA
Date published: 01/04/1999
Date submitted: 17/05/2017
Identifiers: 99515728902346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD

Abstract

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