Process characterization of low temperature ion implantation using ribbon beam and spot beam on the AIBT iPulsar high current

Journal article

Peer reviewed

EJH Collart, R Teel, C Free, Z Wan, P Kopalidis, MA Razali, R Gwilliam, A Smith, E Tsidilkovski and T Karpowicz

AIP Conference Proceedings, Vol.1321, pp.49-52

2010

Abstract

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Title: Process characterization of low temperature ion implantation using ribbon beam and spot beam on the AIBT iPulsar high current
Creators: EJH Collart
R Teel
C Free
Z Wan
P Kopalidis
MA Razali
R Gwilliam
A Smith
E Tsidilkovski
T Karpowicz
Publication Details: AIP Conference Proceedings, Vol.1321, pp.49-52
Date published: 2010
Date submitted: 17/05/2017
Identifiers: 99511597802346
Academic Unit: University of Surrey
Resource Type: Journal article