Plasma Jet Printing and in Situ Reduction of Highly Acidic Graphene Oxide

Avishek Dey; Satheesh Krishnamurthy; James Bowen; Dennis Nordlund; M. Meyyappan; Ram P. Gandhiraman; SLAC National Accelerator Lab., Menlo Park, CA (United States)

doi:10.1021/acsnano.8b00903

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Plasma Jet Printing and in Situ Reduction of Highly Acidic Graphene Oxide

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Plasma Jet Printing and in Situ Reduction of Highly Acidic Graphene Oxide

Avishek Dey, Satheesh Krishnamurthy, James Bowen, Dennis Nordlund, M. Meyyappan, Ram P. Gandhiraman and SLAC National Accelerator Lab., Menlo Park, CA (United States)

ACS nano, Vol.12(6), pp.5473-5481

26/06/2018

DOI: https://doi.org/10.1021/acsnano.8b00903

PMID: 29775279

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Title: Plasma Jet Printing and in Situ Reduction of Highly Acidic Graphene Oxide
Creators: Avishek Dey - The Open University
Satheesh Krishnamurthy - The Open University
James Bowen - The Open University
Dennis Nordlund - SLAC National Accelerator Laboratory
M. Meyyappan - Ames Research Center
Ram P. Gandhiraman - Ames Research Center
SLAC National Accelerator Lab., Menlo Park, CA (United States)
Publication Details: ACS nano, Vol.12(6), pp.5473-5481
Date published: 26/06/2018
Identifiers: 99820347402346
Academic Unit: School of Computer Science and Electronic Engineering
Language: English
Resource Type: Journal article

Plasma Jet Printing and in Situ Reduction of Highly Acidic Graphene Oxide

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