OBSERVATION OF SWELLING AND SPUTTERING OF A SILICON TARGET UNDER ARGON ION IRRADIATION USING A DOUBLE MARKER TECHNIQUE

ZH JAFRI; C JEYNES; RP WEBB; IH WILSON

doi:10.1016/0042-207X(89)91103-2

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OBSERVATION OF SWELLING AND SPUTTERING OF A SILICON TARGET UNDER ARGON ION IRRADIATION USING A DOUBLE MARKER TECHNIQUE

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OBSERVATION OF SWELLING AND SPUTTERING OF A SILICON TARGET UNDER ARGON ION IRRADIATION USING A DOUBLE MARKER TECHNIQUE

ZH JAFRI, C JEYNES, RP WEBB and IH WILSON

VACUUM, Vol.39(11-12), pp.1119-1121

01/01/1989

DOI: https://doi.org/10.1016/0042-207X(89)91103-2

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Science & Technology

Technology

Physical Sciences

Materials Science

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Materials Science

Physics

MATERIALS SCIENCE

MULTIDISCIPLINARY

PHYSICS

APPLIED

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Title: OBSERVATION OF SWELLING AND SPUTTERING OF A SILICON TARGET UNDER ARGON ION IRRADIATION USING A DOUBLE MARKER TECHNIQUE
Creators: ZH JAFRI
C JEYNES
RP WEBB
IH WILSON
Publication Details: VACUUM, Vol.39(11-12), pp.1119-1121
Publisher: PERGAMON-ELSEVIER SCIENCE LTD
Date published: 01/01/1989
Date submitted: 17/05/2017
Identifiers: 99511483702346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

OBSERVATION OF SWELLING AND SPUTTERING OF A SILICON TARGET UNDER ARGON ION IRRADIATION USING A DOUBLE MARKER TECHNIQUE

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