Lithography-free high aspect ratio submicron quartz columns by reactive ion etching

DA Zeze; DC Cox; BL Weiss; SRP Silva

doi:10.1063/1.1647280

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Lithography-free high aspect ratio submicron quartz columns by reactive ion etching

Journal article

Open access

Peer reviewed

Lithography-free high aspect ratio submicron quartz columns by reactive ion etching

DA Zeze, DC Cox, BL Weiss and SRP Silva

APPLIED PHYSICS LETTERS, Vol.84(8), pp.1362-1364

23/02/2004

DOI: https://doi.org/10.1063/1.1647280

Abstract

Science & Technology

Physical Sciences

Physics

Applied

Physics

PHYSICS

APPLIED

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Title: Lithography-free high aspect ratio submicron quartz columns by reactive ion etching
Creators: DA Zeze
DC Cox
BL Weiss
SRP Silva
Publication Details: APPLIED PHYSICS LETTERS, Vol.84(8), pp.1362-1364
Publisher: AMER INST PHYSICS
Date published: 23/02/2004
Date submitted: 27/05/2010
Identifiers: 99511751602346
Academic Unit: School of Computer Science and Electronic Engineering
Language: English
Resource Type: Journal article

Lithography-free high aspect ratio submicron quartz columns by reactive ion etching

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