Ion beam synthesis of low resistivity contacts in amorphous silicon-based materials

NG Emerson; RM Gwilliam; BJ Sealy

doi:10.1007/s11664-001-0109-9

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Ion beam synthesis of low resistivity contacts in amorphous silicon-based materials

Journal article

Peer reviewed

Ion beam synthesis of low resistivity contacts in amorphous silicon-based materials

NG Emerson, RM Gwilliam and BJ Sealy

JOURNAL OF ELECTRONIC MATERIALS, Vol.30(2), pp.L5-L7

01/02/2001

DOI: https://doi.org/10.1007/s11664-001-0109-9

Abstract

Science & Technology

Technology

Physical Sciences

Engineering

Electrical & Electronic

Materials Science

Multidisciplinary

Physics

Applied

Engineering

Materials Science

Physics

ENGINEERING

ELECTRICAL & ELECTRONIC

MATERIALS SCIENCE

MULTIDISCIPLINARY

PHYSICS

APPLIED

ion implantation

amorphous semiconductors

materials synthesis

electrical properties

IMPLANTATION

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Title: Ion beam synthesis of low resistivity contacts in amorphous silicon-based materials
Creators: NG Emerson
RM Gwilliam
BJ Sealy
Publication Details: JOURNAL OF ELECTRONIC MATERIALS, Vol.30(2), pp.L5-L7
Publisher: MINERALS METALS MATERIALS SOC
Date published: 01/02/2001
Date submitted: 17/05/2017
Identifiers: 99513802402346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

Ion beam synthesis of low resistivity contacts in amorphous silicon-based materials

Abstract

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