Influence of precursor gases on the structure of plasma deposited amorphous hydrogenated carbon-nitrogen films

DF Franceschini; FL Freire; SRP Silva

doi:10.1063/1.116268

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Influence of precursor gases on the structure of plasma deposited amorphous hydrogenated carbon-nitrogen films

Journal article

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Influence of precursor gases on the structure of plasma deposited amorphous hydrogenated carbon-nitrogen films

DF Franceschini, FL Freire and SRP Silva

APPLIED PHYSICS LETTERS, Vol.68(19), pp.2645-2647

06/05/1996

DOI: https://doi.org/10.1063/1.116268

Abstract

Science & Technology

Physical Sciences

Physics

Applied

Physics

PHYSICS

APPLIED

DIAMOND-LIKE CARBON

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Title: Influence of precursor gases on the structure of plasma deposited amorphous hydrogenated carbon-nitrogen films
Creators: DF Franceschini
FL Freire
SRP Silva
Publication Details: APPLIED PHYSICS LETTERS, Vol.68(19), pp.2645-2647
Publisher: AMER INST PHYSICS
Date published: 06/05/1996
Date submitted: 29/09/2010
Identifiers: 99516157002346
Academic Unit: School of Computer Science and Electronic Engineering
Language: English
Resource Type: Journal article

Influence of precursor gases on the structure of plasma deposited amorphous hydrogenated carbon-nitrogen films

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