Implantation of silicon using the boron cluster BF2

R Smith; M Harrison; R Webb

doi:10.1016/S0040-6090(98)01714-3

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Implantation of silicon using the boron cluster BF2

Journal article

Peer reviewed

Implantation of silicon using the boron cluster BF2

R Smith, M Harrison and R Webb

THIN SOLID FILMS, Vol.343, pp.602-604

01/04/1999

DOI: https://doi.org/10.1016/S0040-6090(98)01714-3

Abstract

Science & Technology

Technology

Physical Sciences

Materials Science

Multidisciplinary

Materials Science

Coatings & Films

Physics

Applied

Physics

Condensed Matter

Materials Science

Physics

MATERIALS SCIENCE

COATINGS & FILMS

MATERIALS SCIENCE

MULTIDISCIPLINARY

PHYSICS

APPLIED

PHYSICS

CONDENSED MATTER

cluster beams

ion implantation

molecular dynamics

MOLECULAR-DYNAMICS

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Title: Implantation of silicon using the boron cluster BF2
Creators: R Smith
M Harrison
R Webb
Publication Details: THIN SOLID FILMS, Vol.343, pp.602-604
Publisher: ELSEVIER SCIENCE SA
Date published: 01/04/1999
Date submitted: 17/05/2017
Identifiers: 99511156002346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

Implantation of silicon using the boron cluster BF2

Abstract

Files and links (1)

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