Identification of Optimal Doses for Device Quality Thin-Film and Standard Simox Structures Formed by Low (50keV, 70keV or 90keV) or High (200keV) Energy Oxygen Implantation

Journal article

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C. D. Marsh, G. R. Booker, A. Nejim, L. F. Giles, P. L. F. Hemment, Y. Li, R. J. Chater, J. A. Kilner, S. Wainwright and S. Hall

Proceedings of the 1992 International SOI Conference, pp.6-8

Proceedings of the 1992 International SOI Conference

06/10/1992

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Title: Identification of Optimal Doses for Device Quality Thin-Film and Standard Simox Structures Formed by Low (50keV, 70keV or 90keV) or High (200keV) Energy Oxygen Implantation
Creators: C. D. Marsh
G. R. Booker
A. Nejim
L. F. Giles
P. L. F. Hemment
Y. Li
R. J. Chater
J. A. Kilner
S. Wainwright
S. Hall
Publication Details: Proceedings of the 1992 International SOI Conference, pp.6-8
Event: Proceedings of the 1992 International SOI Conference
Date published: 06/10/1992
Date submitted: 27/05/2010
Identifiers: 99514650902346
Academic Unit: School of Computer Science and Electronic Engineering
Resource Type: Journal article