IMPLANT ION COLLECTION IN THE PRESENCE OF RADIATION ENHANCED DIFFUSION AND PREFERENTIAL SPUTTERING OF IMPLANT

G CARTER; R WEBB; R COLLINS

doi:10.1080/01422447908229237

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Journal article

IMPLANT ION COLLECTION IN THE PRESENCE OF RADIATION ENHANCED DIFFUSION AND PREFERENTIAL SPUTTERING OF IMPLANT

G CARTER, R WEBB and R COLLINS

RADIATION EFFECTS LETTERS, Vol.43(4-5), pp.125-132

01/01/1979

DOI: https://doi.org/10.1080/01422447908229237

Abstract

Science & Technology

Technology

Life Sciences & Biomedicine

Nuclear Science & Technology

Radiology

Nuclear Medicine & Medical Imaging

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Title: IMPLANT ION COLLECTION IN THE PRESENCE OF RADIATION ENHANCED DIFFUSION AND PREFERENTIAL SPUTTERING OF IMPLANT
Creators: G CARTER
R WEBB
R COLLINS
Publication Details: RADIATION EFFECTS LETTERS, Vol.43(4-5), pp.125-132
Publisher: GORDON BREACH SCI PUBL LTD
Date published: 01/01/1979
Date submitted: 17/05/2017
Identifiers: 99512480102346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

IMPLANT ION COLLECTION IN THE PRESENCE OF RADIATION ENHANCED DIFFUSION AND PREFERENTIAL SPUTTERING OF IMPLANT

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