Hydrogenated amorphous carbon and carbon nitride films deposited at low pressure by plasma enhanced chemical vapor deposition

Y Miyajima; SJ Henley; SRP Silva

doi:10.1016/j.tsf.2011.04.040

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Hydrogenated amorphous carbon and carbon nitride films deposited at low pressure by plasma enhanced chemical vapor deposition

Journal article

Peer reviewed

Hydrogenated amorphous carbon and carbon nitride films deposited at low pressure by plasma enhanced chemical vapor deposition

Y Miyajima, SJ Henley and SRP Silva

THIN SOLID FILMS, Vol.519(19), pp.6374-6380

29/07/2011

DOI: https://doi.org/10.1016/j.tsf.2011.04.040

Abstract

Amorphous carbon

Plasma-enhanced chemical vapor deposition

Carbon nitride

Optical transmittance

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Title: Hydrogenated amorphous carbon and carbon nitride films deposited at low pressure by plasma enhanced chemical vapor deposition
Creators: Y Miyajima
SJ Henley
SRP Silva
Publication Details: THIN SOLID FILMS, Vol.519(19), pp.6374-6380
Publisher: Elsevier
Date published: 29/07/2011
Date submitted: 31/10/2012
Identifiers: 99514656402346
Academic Unit: University of Surrey
Resource Type: Journal article

Hydrogenated amorphous carbon and carbon nitride films deposited at low pressure by plasma enhanced chemical vapor deposition

Abstract

Files and links (1)

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Details

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