Epitaxial Growth of High-Resistivity CdTe Thick Films Grown Using a Modified Close Space Sublimation Method

Q Jiang; AW Brinkman; P Veeramani; PJ Sellin

doi:10.1143/JJAP.49.025504

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Epitaxial Growth of High-Resistivity CdTe Thick Films Grown Using a Modified Close Space Sublimation Method

Journal article

Peer reviewed

Epitaxial Growth of High-Resistivity CdTe Thick Films Grown Using a Modified Close Space Sublimation Method

Q Jiang, AW Brinkman, P Veeramani and PJ Sellin

JAPANESE JOURNAL OF APPLIED PHYSICS, Vol.49(2), pp.?-?

01/01/2010

DOI: https://doi.org/10.1143/JJAP.49.025504

Abstract

Science & Technology

Physical Sciences

Physics

Applied

Physics

PHYSICS

APPLIED

MOLECULAR-BEAM EPITAXY

CRYSTALS

DEFECTS

GE

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Title: Epitaxial Growth of High-Resistivity CdTe Thick Films Grown Using a Modified Close Space Sublimation Method
Creators: Q Jiang
AW Brinkman
P Veeramani
PJ Sellin
Publication Details: JAPANESE JOURNAL OF APPLIED PHYSICS, Vol.49(2), pp.?-?
Publisher: JAPAN SOC APPLIED PHYSICS
Date published: 01/01/2010
Date submitted: 03/01/2012
Identifiers: 99516306402346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

Epitaxial Growth of High-Resistivity CdTe Thick Films Grown Using a Modified Close Space Sublimation Method

Abstract

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