Electron impact-assisted carbon film growth on Ru(0001): Implications for next-generation EUV lithography

G Kyriakou; DJ Davis; RB Grant; DJ Watson; A Keen; MS Tikhov; RM Lambert

doi:10.1021/jp070485e

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Electron impact-assisted carbon film growth on Ru(0001): Implications for next-generation EUV lithography

Journal article

Peer reviewed

Electron impact-assisted carbon film growth on Ru(0001): Implications for next-generation EUV lithography

G Kyriakou, DJ Davis, RB Grant, DJ Watson, A Keen, MS Tikhov and RM Lambert

JOURNAL OF PHYSICAL CHEMISTRY C, Vol.111(12), pp.4491-4494

29/03/2007

DOI: https://doi.org/10.1021/jp070485e

Abstract

Science & Technology

Physical Sciences

Technology

Chemistry

Physical

Nanoscience & Nanotechnology

Materials Science

Multidisciplinary

Chemistry

Science & Technology - Other Topics

Materials Science

SYNCHROTRON RADIATION

CAPPING LAYERS

ULTRAVIOLET

DESORPTION

SURFACES

KINETICS

OPTICS

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Title: Electron impact-assisted carbon film growth on Ru(0001): Implications for next-generation EUV lithography
Creators: G Kyriakou
DJ Davis
RB Grant
DJ Watson
A Keen
MS Tikhov
RM Lambert
Publication Details: JOURNAL OF PHYSICAL CHEMISTRY C, Vol.111(12), pp.4491-4494
Publisher: AMER CHEMICAL SOC
Date published: 29/03/2007
Date submitted: 09/08/2013
Identifiers: 99514157402346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

Electron impact-assisted carbon film growth on Ru(0001): Implications for next-generation EUV lithography

Abstract

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