Differential Hall characterisation of ultrashallow doping in advanced Si-based materials

Journal article

Peer reviewed

NS Bennett, NEB Cowern, AJ Smith, M Kah, RM Gwilliam, BJ Sealy, TCQ Noakes, P Bailey, D Giubertoni and M Bersani

Materials Science and Engineering B: Solid-State Materials for Advanced Technology, Vol.154-15(1-3), pp.229-233

2008

Abstract

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Title: Differential Hall characterisation of ultrashallow doping in advanced Si-based materials
Creators: NS Bennett
NEB Cowern
AJ Smith
M Kah
RM Gwilliam
BJ Sealy
TCQ Noakes
P Bailey
D Giubertoni
M Bersani
Publication Details: Materials Science and Engineering B: Solid-State Materials for Advanced Technology, Vol.154-15(1-3), pp.229-233
Date published: 2008
Date submitted: 17/05/2017
Identifiers: 99514692202346
Academic Unit: University of Surrey
Resource Type: Journal article