Abstract
Cobalt thin films with tunable nanostructures were deposited onto flat substrates by a simply electrochemical deposition procedure. A number of experimental parameters including solution concentration, the addition of surfactant and deposition time were studied. XRD and TGA data indicated the formation of cobalt metal on substrates. SEM images revealed the morphological evolution of the materials by varying experimental conditions. The resulting cobalt films exhibited noticeably electrochemical oxidation-reduction behaviour upon cyclic voltammogram measurement, which might be used as electrodes for electrochemical application.