Anomalous diffusion of ultra low energy boron implants in silicon

RP Webb; MA Foad; RM Gwilliam; AP Knights; G Thomas

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Anomalous diffusion of ultra low energy boron implants in silicon

Journal article

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Anomalous diffusion of ultra low energy boron implants in silicon

RP Webb, MA Foad, RM Gwilliam, AP Knights and G Thomas

DEFECTS AND DIFFUSION IN SILICON PROCESSING, Vol.469, pp.59-63

01/01/1997

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Science & Technology

Technology

Materials Science

Multidisciplinary

Materials Science

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Title: Anomalous diffusion of ultra low energy boron implants in silicon
Creators: RP Webb
MA Foad
RM Gwilliam
AP Knights
G Thomas
Contributors: TD delaRubia
S Coffa
PA Stolk
CS Rafferty
Publication Details: DEFECTS AND DIFFUSION IN SILICON PROCESSING, Vol.469, pp.59-63
Publisher: MATERIALS RESEARCH SOCIETY
Date published: 01/01/1997
Date submitted: 17/05/2017
Identifiers: 99511139802346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

Anomalous diffusion of ultra low energy boron implants in silicon

Abstract

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