Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS

G Boudreault; G Claudio; C Jeynes; R Low; BJ Sealy

doi:10.1016/j.nimb.2003.09.033

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Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS

Journal article

Peer reviewed

Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS

G Boudreault, G Claudio, C Jeynes, R Low and BJ Sealy

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.217(1), pp.177-182

01/03/2004

DOI: https://doi.org/10.1016/j.nimb.2003.09.033

Abstract

Science & Technology

Technology

Physical Sciences

Instruments & Instrumentation

Nuclear Science & Technology

Physics

Atomic

Molecular & Chemical

Physics

Nuclear

Physics

INSTRUMENTS & INSTRUMENTATION

NUCLEAR SCIENCE & TECHNOLOGY

PHYSICS

ATOMIC

MOLECULAR & CHEMICAL

PHYSICS

NUCLEAR

SURFACE-ANALYSIS

ICP-IDMS

SILICON

SI

CERTIFICATION

INAA

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Title: Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS
Creators: G Boudreault
G Claudio
C Jeynes
R Low
BJ Sealy
Publication Details: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.217(1), pp.177-182
Publisher: ELSEVIER SCIENCE BV
Date published: 01/03/2004
Date submitted: 17/05/2017
Identifiers: 99511037102346
Academic Unit: University of Surrey
Language: English
Resource Type: Journal article

Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS

Abstract

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