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APPLICATION OF THE TRUNCATED TWO-PIECE NORMAL DISTRIBUTION TO THE MEASUREMENT OF DEPTHS OF ARSENIC IMPLANTS IN SILICON.
Journal article   Peer reviewed

APPLICATION OF THE TRUNCATED TWO-PIECE NORMAL DISTRIBUTION TO THE MEASUREMENT OF DEPTHS OF ARSENIC IMPLANTS IN SILICON.

AC Kimber and C Jeynes
Journal of the Royal Statistical Society. Series C: Applied Statistics, Vol.36(3), pp.352-357
01/12/1987

Abstract

The truncated two-piece normal distribution is applied to data obtained from backscattering experiments in order to investigate the depth of arsenic implants in silicon.

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