Abstract
As Silicon Photonics is developing further towards integration on a single platform, the need for precise fabrication is paramount and no matter how developed a technology is, there is always potential for error at the wafer and chip level. In combination with Focused Ion Beam (FIB) technology, we will present direct write methods to fabricate and tailor Silicon Photonic devices to offer the potential of prototyping, testing and correction in a postprocessing environment. However, inherent in most FIB processing is the introduction of large optical loss due to damage and implantation of Gallium, because Gallium is typically the ion species used in FIBs. Therefore, methods of processing to minimise any potential loss and changes to the original device design will also be presented alongside results and a discussion offering a comparison with other potential methods. Actual results from the application of a FIB to fabricate a Bragg Grating Filter, to trim a waveguide bend and to map the residual Gallium contamination are presented within. Using the information gathered through these different examples, a micro disk resonator, initially faulty when fabricated, has been successfully tailored with a FIB using a direct write approach. The repaired device which initially had very poor resonator characteristics, subsequently exhibited a Quality Factor (Q) of 125, a Free Spectral Range (FSR) of 1.25nm, a Full Width Half Maximum (FWHM) of 250pm all with a Finesse (F) of 5 after FIB processing. Whilst the work presented within, and the figures of merit for the repaired resonator are not the best to be reported within the literature, they are "proof of principle" evidence that the FIB cab be successfully utilised as a tool for repairing a faulty device, in a simple one step process.