Data for Paper: The Impact of Substrate Bias on a Remote Plasma Sputter Coating Process for Conformal Coverage of Trenches and 3D Structures

Dataset

Hayley Brown

University of Surrey

17/11/2020

DOI:

https://doi.org/10.15126/surreydata.00807911

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Title: Data for Paper: The Impact of Substrate Bias on a Remote Plasma Sputter Coating Process for Conformal Coverage of Trenches and 3D Structures
Creators: Hayley Brown (Principal Investigator)
Contributors: Sarah Thornley
Steve Wakeham
Thwaites Mike
Richard J Curry
Mark A Baker
Publisher: University of Surrey
Format: Graphs, SEM, EDX
Date published: 17/11/2020
Grant note: Funder: EPSRC | Funder: Plasma Quest Ltd | Grant Title: n/a | Funding Note: The Properties and Performance of Moisture/Oxygen Barrier Layers Deposited by Remote Plasma Sputtering
Identifiers: 99511049802346
Copyright: No Restrictions";"CC-BY
Academic Unit: School of Mechanical Engineering Sciences
Language: English
Resource Type: Dataset