- Title
- On artefacts in the secondary ion mass spectrometry profiling of high fluence H+ implants in GaAs
- Creators
- MJ BaileyC JeynesBJ SealyRP WebbRM Gwilliam
- Contributors
- ELSEVIER SCIENCE BV (null)
- Publication Details
- NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.268(11-12), pp.2051-2055
- Conference
- 19th International Conference on Ion Beam Analysis (Univ Cambridge, Cambridge, ENGLAND, 07/09/2009 - 11/09/2009)
- Date published
- 01/06/2010
- Date submitted
- 12/08/2013
- Identifiers
- 99511941102346
- Academic Unit
- University of Surrey; Department of Chemistry
- Resource Type
- Conference presentation
Conference presentation
On artefacts in the secondary ion mass spectrometry profiling of high fluence H+ implants in GaAs
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.268(11-12), pp.2051-2055
19th International Conference on Ion Beam Analysis (Univ Cambridge, Cambridge, ENGLAND, 07/09/2009 - 11/09/2009)
01/06/2010
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