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Nonconventional flash annealing on shallow indium implants in silicon
Conference presentation   Peer reviewed

Nonconventional flash annealing on shallow indium implants in silicon

S Gennaro, D Giubertoni, M Bersani, J Foggiato, WS Yoo and R Gwilliam
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Vol.24(1), pp.473-477
8th International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors (Daytona Beach, FL, 05/06/2005 - 08/06/2005)
01/01/2006
DOI: https://doi.org/10.1116/1.2132321

Abstract

Science & Technology Technology Physical Sciences Engineering Electrical & Electronic Nanoscience & Nanotechnology Physics Applied Engineering Science & Technology - Other Topics Physics ENGINEERING ELECTRICAL & ELECTRONIC NANOSCIENCE & NANOTECHNOLOGY PHYSICS APPLIED TRANSIENT ENHANCED DIFFUSION ELECTRICAL ACTIVATION CARBON SI JUNCTIONS
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