Low-temperature sputter deposition and characterisation of carbon nitride films

MA Baker; P Hammer; C Lenardi; J Haupt; W Gissler

doi:10.1016/S0257-8972(97)00187-4

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Low-temperature sputter deposition and characterisation of carbon nitride films

Conference presentation

Peer reviewed

Low-temperature sputter deposition and characterisation of carbon nitride films

MA Baker, P Hammer, C Lenardi, J Haupt and W Gissler

SURFACE & COATINGS TECHNOLOGY, Vol.97(1-3), pp.544-551

5th International Conference on Plasma Surface Engineering (GARMISCH PARTENKI, GERMANY, 09/09/1996 - 13/09/1996)

01/12/1997

DOI: https://doi.org/10.1016/S0257-8972(97)00187-4

Abstract

Science & Technology

Technology

Physical Sciences

Materials Science

Coatings & Films

Physics

Applied

Materials Science

Physics

MATERIALS SCIENCE

COATINGS & FILMS

PHYSICS

APPLIED

carbon nitride

characterisation

sputter deposition

thin film

THIN-FILMS

GRAPHITE

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Title: Low-temperature sputter deposition and characterisation of carbon nitride films
Creators: MA Baker
P Hammer
C Lenardi
J Haupt
W Gissler
Contributors: ELSEVIER SCIENCE SA (Publisher)
Publication Details: SURFACE & COATINGS TECHNOLOGY, Vol.97(1-3), pp.544-551
Conference: 5th International Conference on Plasma Surface Engineering (GARMISCH PARTENKI, GERMANY, 09/09/1996 - 13/09/1996)
Date published: 01/12/1997
Date submitted: 17/05/2017
Identifiers: 99513558002346
Academic Unit: University of Surrey
Resource Type: Conference presentation

Low-temperature sputter deposition and characterisation of carbon nitride films

Abstract

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