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Ion implanted silicides studies by frequency noise level measurements
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Ion implanted silicides studies by frequency noise level measurements

M Stojanovic, A Vasic and C Jeynes
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Vol.112(1-4), pp.192-195
Symposium J on Correlated Effects in Atomic and Cluster Ion Bombardment and Implantation/Symposium C on Pushing the Limits of Ion Beam Processing - From Engineering to Atomic Scale Issues, at the E-MRS 95 Spring Meeting (STRASBOURG, FRANCE, 22/05/1995 - 26/05/1995)
01/05/1996

Abstract

Science & Technology Technology Physical Sciences Instruments & Instrumentation Nuclear Science & Technology Physics Atomic Molecular & Chemical Physics Nuclear Physics INSTRUMENTS & INSTRUMENTATION NUCLEAR SCIENCE & TECHNOLOGY PHYSICS ATOMIC MOLECULAR & CHEMICAL PHYSICS NUCLEAR CONTACTS SILICON
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