Impact of 193nm Resist Shrinkage on CD-SEM Metrology

Conference presentation

Peer reviewed

Impact of 193nm Resist Shrinkage on CD-SEM Metrology

T. Hoffmann, G. Storms, M. Ercken, M. Maenhoudt, I. Pollentier, K. Ronse, F. Felten, E. Wong and Jonathan England

Interface 2001 Conference (2001)

2001

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Title: Impact of 193nm Resist Shrinkage on CD-SEM Metrology
Creators: T. Hoffmann
G. Storms
M. Ercken
M. Maenhoudt
I. Pollentier
K. Ronse
F. Felten
E. Wong
Jonathan England
Conference: Interface 2001 Conference (2001)
Date published: 2001
Date submitted: 09/06/2017
Identifiers: 99512194502346
Academic Unit: School of Computer Science and Electronic Engineering
Resource Type: Conference presentation